High Frequency R.F. Transmitters

The use of high frequency radio frequency (R.F.) transmitters is instrumental in creating a high efficiency plasma surface treatment. High frequency plasma also helps improve uniformity of plasma across the electrode’s surface. The frequency used by plasma systems is generally a constant 13.56 MHz. RF transmission power is constant throughout the plasma treatment process and is independent of other plasma parameters such as temperature and vacuum settings. The RF power is selected via a switch on the plasma cleaning system or in the software controls depending on the make and model of the unit.

Advantages of High Frequency R.F. Transmitters

The isotropic properties of high frequency plasma allows for the etching and cleaning of oddly shaped and curved objects. More reactive plasma is generated by a high frequency R.F. transmitter, resulting in a faster etch rate.