Posted November 13th, 2020 in Press Release
Researchers at UCLA published new findings that point to a significant breakthrough in the fight against COVID-19: cold atmospheric plasma.
According to a study published by Physics of Fluids, by AIP Publishing, cold atmospheric plasma created with argon – similar to the plasma created by Plasma Etch’s Plasma Wand and multi-gas nozzle – deactivates SARS-CoV-2, the virus that causes COVID-19.
Testing was performed on 6 surfaces: plastic, metal, cardboard and basketball, football, and baseball leather.
The virus was inactivated on every surface they tested in less than 3 minutes.
Follow up testing on cotton face masks showed most of the SARS-CoV-2 virus was deactivated in 30 seconds, and all of it was deactivated in 3 minutes.
This plasma requires only argon, air, and electricity to produce, so there are no dangerous chemicals or side effects. Zhitong Chen, one author of the study, noted, “Everything we use comes from the air. Air and electricity: It’s a very healthy treatment with no side effects.”
Researchers hope the benefits of cold plasma will be made available worldwide. Plasma Etch has seen a significant increase in interest around atmospheric plasma since the COVID-19 pandemic began, and sales of atmospheric systems have been very strong in recent months.
Plasma Etch’s full line of atmospheric plasma cleaners may be viewed on their website: https://www.plasmaetch.com/plasma-cleaning-systems.php#atmospheric
The publication may be viewed here: https://publishing.aip.org/publications/latest-content/plasmatreatments-quickly-kill-coronavirus-on-surfaces/
About Plasma Etch: Plasma Etch has been a leading manufacturer and industry innovator since 1980. The company holds several patents for the invention, development, and manufacturing of groundbreaking innovations, paving the way for plasma technology and the enhancement of quality manufacturing worldwide. Plasma Etch specializes in plasma cleaning solutions of all sizes. Their products are industry proven and set the standard for reliability, speed, and uniformity in plasma processing.
The original press release may be found here: